NEWS 8 September 2022

A lensless approach to EUV and soft X-ray microscopy

Semiconductor features such as transistors used in computer chips have reached the nanometer scale, yet metrology tools still have to follow the advances in the industry to study this new generation of chips.

Short-wavelength microscopy using extreme ultraviolet (EUV) light or soft X-rays could offer a solution, but it is not compatible with conventional imaging optics. This Mikroniek article presents a lensless microscope built by researchers from Delft University of Technology. It uses coherent EUV light to make an image at the scale of 100 nm. With further refining of this technique, they expect to drastically improve the resolution, possibly down to wavelength scales. (Image courtesy of Sven Weerdenburg, TU Delft).

We use cookies to improve your experience on our website

References

Order of frictions and stiffnesses…

For lumped systems consisting of different frictions and stiffnesses, there has been confusion in literature about hysteresis curves and virtual play for many decades.

Make it clean

In mid-April, the second edition of the Manufacturing Technology Conference and the fifth edition of the Clean Event were held together, for the first time, at the Koningshof in Veldhoven (NL).

Bringing particles to light

Particle contamination monitoring and cleanliness control are fundamental to micromanufacturing processes across diverse industries to achieve cost-effective production of high-quality and reliable microscale devices and components.