Dutch design: the TriNano micro CMM

The TriNano, a new coordinate measuring machine (CMM), has been designed in line with needs from industrial and academic CMM users. Many of these users do not require a large measurement volume, but need nanometer uncertainty within a measurement volume of about 20-40 cm3. This reduction in measurement volume enables the TriNano to employ a new 3D actuation principle, resulting in a low-cost CMM with nanometer uncertainty.

Download Mikroniek 2010-4

Back to overview

We use cookies to improve your experience on our website

References

Order of frictions and stiffnesses…

For lumped systems consisting of different frictions and stiffnesses, there has been confusion in literature about hysteresis curves and virtual play for many decades.

Make it clean

In mid-April, the second edition of the Manufacturing Technology Conference and the fifth edition of the Clean Event were held together, for the first time, at the Koningshof in Veldhoven (NL).

Bringing particles to light

Particle contamination monitoring and cleanliness control are fundamental to micromanufacturing processes across diverse industries to achieve cost-effective production of high-quality and reliable microscale devices and components.