De uitdagingen van EUVL

Control Precision-technology
Mikroniek 4 2007 by Erik Loopstra, Rob Munnig Schmidt 3 October 2008

Vorig jaar zomer verscheepte ASML vanuit Veldhoven de eerste testversies van een nieuwe generatie halfgeleider-productiesystemen op basis van Extreme Ultraviolet Lithography (EUVL). Deze systemen kunnen nog fijnere lijnen (32 nanometer en kleiner) printen en dus veel goedkopere, snellere en kleinere chips vervaardigen. Mikroniek schetst in vogelvlucht de uitdagingen waarvoor de engineers van ASML en partners zich gesteld zien bij de ontwikkeling en het productierijp maken van EUVL-systemen.


References

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