NEWS 1 October 2019

Mikroniek: Large dynamic range atomic force microscope

The second part of the Optics Week, on 1-3 October 2019, was filled with the Optomechanical system design course.

DSPE

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a large dynamic range atomic force microscope demonstrator; the LDR-AFM can measure marker-to-feature distances over several millimeters with sub-nanometer reproducibility. This Mikroniek article describes a highly stable metrology concept and a 6-degrees-of-freedom positioning platform (hexapod) carrying an AFM scan head able to move the AFM probe tip. Repeatability measurements have demonstrated that both drift and reproducibility figures are well below the smallest feature size of the newest semiconductor processing nodes.


References

Mikroniek September: Optomechatronics

The September issue of Mikroniek, click here for a first impression, features the theme of optomechatronics in anticipation of the DSPE Optics Week 2017. A preview of the event is...

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Lunch lecture June 7 hosted…

This DSPE Lunch Lecture is hosted by ASM Pacific Technology The title is “Settling performance improvements of bonding semicon manufacturing equipment using nonlinear motion control strategies” The lecture will be given...

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Mikroniek December: Software & machine…

The December issue of Mikroniek, click here for a first impression, features the theme of Software & machine learning. It covers applications in system control, surface metrology and mechanism design....

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