Lunch Lecture April hosted by ASML
Theme: Concept optimization of system dynamics of a wafer metrology tool
In a rapidly evolving technological landscape, the demand for computing power continues to grow exponentially. This places increasing performance requirements on lithographic scanners and metrology equipment, which must retain extremely high positioning accuracy while simultaneously delivering increased throughput. To ensure that ASML’s Yieldstar metrology tool remains prepared for future demands, in this talk a novel passive damping approach is presented which is based on the existing constrained layer damping principle, allowing for significantly higher decay rate and thereby reducing settling time.
Spreker: Wietse Maas, Mechanical Engineer ASML
Company: ASML
Date: April 13 2026
Time: 12:02pm
Location: Teams
Please send an email to info@dspe.nl if you are interested in following this lecture (only for members)
