NEWS 2 February 2021

Large dynamic range atomic force microscope

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a...


In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a large dynamic range atomic force microscope demonstrator; the LDR-AFM can measure marker-to-feature distances over several millimeters with sub-nanometer reproducibility. This Mikroniek article describes a highly stable metrology concept and a 6-degrees-of-freedom positioning platform (hexapod) carrying an AFM scan head able to move the AFM probe tip. Repeatability measurements have demonstrated that both drift and reproducibility figures are well below the smallest feature size of the newest semiconductor processing nodes.


References

Picometer drift and microrad reproducibility

At the end of May, Settels Savenije hosted a DSPE Knowledge Day dedicated to challenges in nanometrology.

Read more
Order of frictions and stiffnesses…

For lumped systems consisting of different frictions and stiffnesses, there has been confusion in literature about hysteresis curves and virtual play for many decades.

Read more
Make it clean

In mid-April, the second edition of the Manufacturing Technology Conference and the fifth edition of the Clean Event were held together, for the first time, at the Koningshof in Veldhoven (NL).

Read more