NEWS 2 February 2021

Large dynamic range atomic force microscope

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a...

Julie van Stiphout - Sassen

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a large dynamic range atomic force microscope demonstrator; the LDR-AFM can measure marker-to-feature distances over several millimeters with sub-nanometer reproducibility. This Mikroniek article describes a highly stable metrology concept and a 6-degrees-of-freedom positioning platform (hexapod) carrying an AFM scan head able to move the AFM probe tip. Repeatability measurements have demonstrated that both drift and reproducibility figures are well below the smallest feature size of the newest semiconductor processing nodes.


References

DSPE Conference 2021 September 14…

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Mikroniek October: Big Science and…

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DSPE Conference 14-15 September 2021

On September 14 and 15 the DSPE Conference Special Edition was held at the premises of  “The Royal Netherlands Air Force Historic Flight”. Subjects included societal and research challenges such...

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