NEWS 2 February 2021

Large dynamic range atomic force microscope

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a...

Julie van Stiphout - Sassen

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a large dynamic range atomic force microscope demonstrator; the LDR-AFM can measure marker-to-feature distances over several millimeters with sub-nanometer reproducibility. This Mikroniek article describes a highly stable metrology concept and a 6-degrees-of-freedom positioning platform (hexapod) carrying an AFM scan head able to move the AFM probe tip. Repeatability measurements have demonstrated that both drift and reproducibility figures are well below the smallest feature size of the newest semiconductor processing nodes.


References

Wafer-handler systems engineering and magnetic…

A systems engineering approach to the design of a wafer handler is presented in this Mikroniek article, starting with an introduction to wafer handling, followed by the corresponding requirements and...

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Thermo-Mechanics website live!

This website was developed by a group of people, passionate about Thermo-Mechanics. They contributed their free time to writing and reviewing the content and building the website. If there are...

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Launch book Natlab

Time: 18:00 – 21:00    The authors of the book Natlab, kraamkamer van ASML, NXP en de cd, Paul van Gerven en René Raaijmakers will organise a Natlab meeting on...

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