NEWS 2 February 2021

Large dynamic range atomic force microscope

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a...


In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a large dynamic range atomic force microscope demonstrator; the LDR-AFM can measure marker-to-feature distances over several millimeters with sub-nanometer reproducibility. This Mikroniek article describes a highly stable metrology concept and a 6-degrees-of-freedom positioning platform (hexapod) carrying an AFM scan head able to move the AFM probe tip. Repeatability measurements have demonstrated that both drift and reproducibility figures are well below the smallest feature size of the newest semiconductor processing nodes.


References

YPN visit IBS precision engineering…

We will visit IBS Precision Engineering, located in Eindhoven. IBSPE has been helping customers address unique problems for over 30 years. With their expert knowledge in metrology, they understand the true meaning of ultra precision engineering.

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Lunch Lecture June hosted by…

Development of a Fully Autonomous Tractor for Sustainable Agriculture

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Report of the successful DSPE…

Last month, the DSPE Optomechatronics Week 2023 was a great success. Preceded by a fully booked three-day Optomechanical System Design course, the DSPE Optomechatronics Symposium on Thursday 30 March attracted about 100 participants.

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