NEWS 2 February 2021

Large dynamic range atomic force microscope

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a...

Julie van Stiphout - Sassen

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a large dynamic range atomic force microscope demonstrator; the LDR-AFM can measure marker-to-feature distances over several millimeters with sub-nanometer reproducibility. This Mikroniek article describes a highly stable metrology concept and a 6-degrees-of-freedom positioning platform (hexapod) carrying an AFM scan head able to move the AFM probe tip. Repeatability measurements have demonstrated that both drift and reproducibility figures are well below the smallest feature size of the newest semiconductor processing nodes.


References

Symposium succesfully kicks off DSPE…

The DSPE Optics and Optomechatronics Symposium is the second edition of the bi-annual event, which started two years ago in Eindhoven, the Netherlands. The target group includes engineers who can...

Read more
Design of a retractable imaging…

A novel design of a retractable imaging device that is able to facilitate a fragile image sensor has been developed. Two major design challenges characterise this design project. Firstly, the...

Read more
CALL FOR PAPERS 30th ASPE…

Austin, Texas, USA is the site of the 30th Annual Meeting of the American Society for Precision Engineering.   The Annual Meeting will feature a balanced program combining tutorials, student...

Read more