NEWS 19 December 2021

Active contamination control for equipment and substrates

High-end manufacturing equipment has to support increasing levels of cleanliness.


First-tier high-tech system supplier VDL ETG is pro-actively developing capabilities in product design as well as in production process design to support increasing requirements on cleanliness. Where knowledge gaps exist, VDL ETG supports research to further the state-of-art, for example in the ACCESS project: Active Contamination Control for Equipment and SubstrateS. In this project, VDL ETG and Eindhoven University of Technology (TU/e) work together as a multidisciplinary team, to deepen the fundamental understanding of generation, transport and removal of particle contamination. This Mikroniek article presents an overview of the project.

VDL ETG development lab. (Photo: Bram Saeys)

References

Order of frictions and stiffnesses…

For lumped systems consisting of different frictions and stiffnesses, there has been confusion in literature about hysteresis curves and virtual play for many decades.

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Make it clean

In mid-April, the second edition of the Manufacturing Technology Conference and the fifth edition of the Clean Event were held together, for the first time, at the Koningshof in Veldhoven (NL).

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Bringing particles to light

Particle contamination monitoring and cleanliness control are fundamental to micromanufacturing processes across diverse industries to achieve cost-effective production of high-quality and reliable microscale devices and components.

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