Chemical or molecular contaminants are harmful in vacuum applications because they reduce the yield and life of machine components. Molecular contamination can be prevented by using suitable materials, clean gases and ensuring that parts are properly cleaned, manufactured, assembled and inspected. This Knowledge Day will focus on Molecular Contamination Control through several very interesting topics and presented by speakers from the Semicon, Space and Analytical industries.

Speakers:

• Welcome by DSPE (Kasper van den Broek)
• Freek Molkenboer, NEVAC: Introduction vacuum and the Dutch vacuum society. Vacuum, what is vacuum? What is ultra-clean vacuum? Why does vacuum play such a key role in our modern day society? These and other questions I will discuss during my talk at this event.
• Paul de Heij, VDL ETG: Challenges in molecular contamination control during manufacturing of EUVL frames. The presentation will focus on the complexity of preventing “forbidden“ elements on the surface of grade 1 EUVL parts.
• Rients de Groot, Thermo Fisher Scientific: Cleanliness for Electron Microscopy. Thermo Fisher Scientific Electron Microscopes require a very high cleanliness level for an optimal performance, especially the parts and modules in contact with the vacuum environments (HV and UHV/XHV). The cleanliness in the manufacturing process of parts and the assembly process of the parts and modules plays an important role in the result. In the presentation the manufacturing aspects will be highlighted, the specification and validation will be presented, and examples shown.
• Gabby Kroes, SRON: The practical difference between cleanliness and contamination. How far can you go?
• Peter Kerkhof, TNO: EBL2, Sample Gripper Flipper. Handling of sample holders and reticles in EBL2’s different vacuum regimes.

Program

If you would like to join this knwoledge day please send an email to info@dspe.nl