NEWS 16 December 2022

Molecular contamination control enables the ‘big enabler’ – vacuum

Chemical or molecular contaminants are harmful in vacuum applications because they disturb the operation, which can lead to lower production yield or faulty measurements.

For example. Molecular contamination can be prevented by using suitable materials and clean gases, and by ensuring that parts are properly cleaned, manufactured, assembled and inspected. These issues were the focus of the DSPE Knowledge Day Molecular Contamination Control, hosted by TNO in early November. The report of the event in this Mikroniek article features presentations from the semicon, space and analytical industries, as well as a tour of TNO research facilities, including the advanced EBL2 (EUV Beam Line 2). (Image courtesy of Thermo Fisher Scientific)


Picometer drift and microrad reproducibility

At the end of May, Settels Savenije hosted a DSPE Knowledge Day dedicated to challenges in nanometrology.

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Order of frictions and stiffnesses…

For lumped systems consisting of different frictions and stiffnesses, there has been confusion in literature about hysteresis curves and virtual play for many decades.

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Make it clean

In mid-April, the second edition of the Manufacturing Technology Conference and the fifth edition of the Clean Event were held together, for the first time, at the Koningshof in Veldhoven (NL).

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