EVENT 11 August 2020
ASPE 2020 Spring Topical Meeting
Oak Ridge National Laboratory Manufacturing Demonstration FacilityKnoxville, Tennessee, USA Short Abstracts due April 3, 2020 Co-Chairs:John S. Taylor, University of North Carolina at CharlotteRichard Leach, University of Nottingham,...
About this event
Oak Ridge National Laboratory
Manufacturing Demonstration Facility
Knoxville, Tennessee, USA
Short Abstracts due April 3, 2020
Co-Chairs:
John S. Taylor, University of North Carolina at Charlotte
Richard Leach, University of Nottingham, UK
Organizing Committee:
David J. Bate, Nikon Metrology, UK
Marcin B. Bauza, Carl Zeiss Industrial Metrology
Douglas A. Bristow, Missouri University of Science and Technology
Adam Brooks, EWI
Simone Carmignato, University of Padua, Italy
Christopher J. Evans, University of North Carolina at Charlotte
Wim Dewulf, KU Leuven, Belgium
Pete J. Fitsos, Lawrence Livermore National Laboratory
Jason C. Fox, National Institute of Standards and Technology
Brett Griffith, Kansas City National Security Campus
Ola L. A. Harrysson, North Carolina State University
Paul Hooper, Imperial College, UK
Bradley H. Jared, Sandia National Laboratories
Fred van Keulen, Delft University of Technology, Netherlands
Michael M. Kirka, Oak Ridge National Laboratory
Shan Lou, University of Huddersfield, UK
Stephen J. Ludwick, Aerotech, Inc.
David Bue Pedersen, Technical University of Denmark, Denmark
William H. Peter, Oak Ridge National Laboratory
Ton Peijnenburg, VDL Enabling Technologies Group, Netherlands
Senajith Rekawa, Lawrence Berkeley National Laboratory
Tony Schmitz, University of Tennessee, Knoxville
Adam Thompson, University of Nottingham, UK
Ann Witvrouw, KU Leuven, Belgium
Xiayun Zhao, University of Pittsburgh
References
Order of frictions and stiffnesses…
For lumped systems consisting of different frictions and stiffnesses, there has been confusion in literature about hysteresis curves and virtual play for many decades.
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Make it clean
In mid-April, the second edition of the Manufacturing Technology Conference and the fifth edition of the Clean Event were held together, for the first time, at the Koningshof in Veldhoven (NL).
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Bringing particles to light
Particle contamination monitoring and cleanliness control are fundamental to micromanufacturing processes across diverse industries to achieve cost-effective production of high-quality and reliable microscale devices and components.
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