EVENT 11 August 2020

ASPE 2020 Spring Topical Meeting

Oak Ridge National Laboratory Manufacturing Demonstration FacilityKnoxville, Tennessee, USA   Short Abstracts due April 3, 2020   Co-Chairs:John S. Taylor, University of North Carolina at CharlotteRichard Leach, University of Nottingham,...


About this event

Oak Ridge National Laboratory

Manufacturing Demonstration Facility
Knoxville, Tennessee, USA

 

Short Abstracts due April 3, 2020

 

Co-Chairs:
John S. Taylor, University of North Carolina at Charlotte
Richard Leach, University of Nottingham, UK

 

Organizing Committee:
David J. Bate, Nikon Metrology, UK
Marcin B. Bauza, Carl Zeiss Industrial Metrology
Douglas A. Bristow, Missouri University of Science and Technology
Adam Brooks, EWI
Simone Carmignato, University of Padua, Italy
Christopher J. Evans, University of North Carolina at Charlotte
Wim Dewulf, KU Leuven, Belgium
Pete J. Fitsos, Lawrence Livermore National Laboratory
Jason C. Fox, National Institute of Standards and Technology
Brett Griffith, Kansas City National Security Campus
Ola L. A. Harrysson, North Carolina State University
Paul Hooper, Imperial College, UK
Bradley H. Jared, Sandia National Laboratories
Fred van Keulen, Delft University of Technology, Netherlands
Michael M. Kirka, Oak Ridge National Laboratory
Shan Lou, University of Huddersfield, UK
Stephen J. Ludwick, Aerotech, Inc.
David Bue Pedersen, Technical University of Denmark, Denmark
William H. Peter, Oak Ridge National Laboratory
Ton Peijnenburg, VDL Enabling Technologies Group, Netherlands
Senajith Rekawa, Lawrence Berkeley National Laboratory
Tony Schmitz, University of Tennessee, Knoxville
Adam Thompson, University of Nottingham, UK
Ann Witvrouw, KU Leuven, Belgium
Xiayun Zhao, University of Pittsburgh

 

More information


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References

Lunch Lecture March hosted by…

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Winner of the Rien Koster…

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Large dynamic range atomic force…

In semiconductor manufacturing, the shrink following Moore’s law requires ever tighter overlay and registration between the different (material) layers. For accurately characterising this overlay and registration, TNO has developed a...

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