EVENT 4 March 2026
Lunch Lecture April hosted by ASML
Titel: Concept optimization of system dynamics of a lithography tool.
About this event
In a rapidly evolving technological landscape, the demand for computing power continues to grow exponentially. This places increasing performance requirements on lithographic scanners and metrology equipment, which must retain extremely high positioning accuracy while simultaneously delivering increased throughput. To ensure advanced semiconductor lithography systems remain prepared for future demands, in this talk a novel passive damping approach is presented which is based on the existing constrained layer damping principle, allowing for significantly higher decay rate and thereby reducing settling time.
Spreker: Wietse Maas, Mechanical Engineer ASML
Company: ASML
Date: April 13 2026
Time: 12:02pm
Location: Teams
Please send an email to info@dspe.nl if you are interested in following this lecture (only for members)
The Netherlands
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