Euspen 10th International Conference

Mikroniek 2010-4 by Raymond Knaapen and Hans van Eerden 8 April 2012

From 31 May to 4 June 2010, the euspen 10th International Conference was held at Delft University of Technology, the Netherlands. The conference attracted over 400 participants and some 45 exhibitors from Europe, America and Asia. Keynotes were concerned with Extreme Ultra Violet Lithography (EUVL) and Adaptive Optics (AO). Besides, a large number of oral and poster presentations was delivered on the latest advances and market developments in precision processes and manufacturing, as well as fabrication, metrology, sensing applications and cutting-edge materials. The programme also included preconference tutorials, an international football match, a commercial session and exhibition, a conference dinner, and technical tours.


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