Successful DSPE Optics & Optomechatronics Symposium
The first DSPE Optics & Optomechatronics Symposium took place in the conference centre of the High Tech Campus Eindhoven (HTCE).
Topics included the design and manufacturing of optics as well as optomechanics, and their implementation in optomechatronic systems. With top-class speakers from the world's leading companies, over 110 delegates and an exhibition hosting seven companies, the inaugural edition of this DSPE initiative was a great success. Read the full report in the latest Mikroniek issue.
Delegates in deep concentration at the symposium (l). And at networking event (r)
(Photos: Jan Pasman)
With lectures from the following speakers:
Wilhelm Ulrich Sr. Director Optical Deisgn Carl Zeiss:
Stefan Sinzinger Head of Technical Optics TU Ilmenau:
"Freeform surfaces in optical microsystems -from design to applications"
Wolfgang Vollrath Chief Scientist KLA-Tencor MIE GmbH:
"Optical design and manufacturing requirements for high performance microscope objectives"
Arie den Boef Fellow ASML:
"Optical Metrology of Semiconductor Wafers in Lithography"
Bert van der Pasch Fellow ASML:
"System-stability in a lithography wafer scanner"
Jan Nijenhuis Sr. System Engineer TNO:
"The opto-mechanical performance of the mirror segments for the E-ELT"
Chris Velzel Author of:
"A Course in Lens design"
Chairman of the day:
Jan-Willem Martens VP Systems Engineering